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Hastelloy C 276 Electrode For Flowmeter
Hastelloy electrodes for magnetic flow meter. The electrodes widely used for electromagnetic flow meter producing, we can customized according your requirements. 316L electrode , Titanium electrode ,Tantalum electrode ,Hastelloy-C electrode.
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Hastelloy C22 Pipe fittings
Hastelloy C 22 Pipe fittings ( Short Radius Elbows , Long Radius Elbows , Concentric Reducers , Eccentric Reducers , Stub Ends , End Caps , Equal Tees , Weldolets , Pipe Nipples .) ASME/ANSI B16.9, ASME B16.28, MSS-SP-43, MSS SP-79 , Type Seamless / Welded / Fabricated . Hastelloy C-22 / UNS N06022 / DIN W. Nr. 2.4602
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Hastelloy C 276 Pipe fittings
Hastelloy C 276 Pipe fittings ( Short Radius Elbows , Long Radius Elbows , Concentric Reducers , Eccentric Reducers , Stub Ends , End Caps , Equal Tees , Weldolets , Pipe Nipples .) ASME/ANSI B16.9, ASME B16.28, MSS-SP-43, MSS SP-79 , Type Seamless / Welded / Fabricated Hastelloy C276 Pipe Fittings UNS (N10276), DIN (2.4819).
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Inconel 625 Rod
Inconel Round Bar , ASTM B446 Inconel, 625 Bright Round Rod , Inconel 625 Hex Rods ,Inconel 625 flat bar with standard ASTM B446 / ASME SB446 and Nickel Alloy 625/ Inconel 625 (AMS 5666)
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Inconel 601 Welding Wire
Inconel 601 Welding Wire - UNS N06601 - DIN W. Nr.2.4851 . ERNiCrFe-11 (Alloy 601) . ASME II, Part C, SFA-5.14, ERNiCrFe-11 (UNS N06601) , ASME IX, F-No.43 , BS290] NA 49 , DIN 1736 SG-NiCr23Al (2.4626) , (EN) ISO 18274 - SN16601 (NiCr23Fel5Al) , ASME III (NCA3800, NB2400), AMS and other specifications
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Inconel 600 Welding Wire
Inconel 600 Wire ASTM B166 , Inconel 600 welding wire Alloy 600. UNS N06600 / W.Nr. 2.4816 .Nickel Alloy (AWS A5.11) ENiCrFe-3 Welding Electrode, Nickel Alloy ENiCrFe-3 Welding Electrode, ENiCrFe-3 inconel 600
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Invar 32 Wire
Invar 32 Wire Super-Invar 32-5 rod UNS-K-93500, Consisting of 32% Nickel, 5% Cobalt, and the balance Iron, this alloy exhibits minimum thermal expansion (one half of Invar 36) at room temperature. It is often used in structural components, supports and substrates requiring precision measurements. ASTM F1684.
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Invar 32 Sheet
Invar 32 Sheet, plate , Invar Alloy Foil , Super Invar 32-5 Alloy DESCRIPTION. A low expansion alloy consisting of 32% Nickel, 5% Cobalt, balance Iron. This alloy exhibits minimum thermal expansion (one half of Invar 36) Invar-36, Invar-42, Pernifer 36, Invar Steel, Super Invar 32-5, Carpenter 36, 4J32, 4J36
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Invar 36 Plate
Alloy 36 Sheet (Invar) / K93603 / ASTM F1684 Widely known under several trades names such as Invar and Nilo 36**, this grade is a 36% nickel-iron alloy. AMS l-23011 CL7MIL l-23011 CL7UNS K93602/03 4J36 (China), Fe-Ni36 (France), 1.3912, Ni36 (Germany), X1NiCrMoCu, N 25-20-7 (UK) Invar 36, UNSK93600 thermostat alloy, UNSK93601 pressure vessel sheet (USA)
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Alloy 46 Wire
Alloy 46 wire : Consisting of 46% nickel and iron balance, 46 Alloy is a controlled expansion alloy used mostly in electronic applications, especially for glass and ceramic seals. Alloy 46 is also known as Pernifer 462, NILO 464, and Glass-Seal 461 , ,Fe46Ni
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Alloy 46 Sheet
Alloy 46: Consisting of 46% nickel and iron balance, 46 Alloy is a controlled expansion alloy used mostly in electronic applications, especially for glass and ceramic seals. Alloy 46 is also known as Pernifer 462, NILO 464, and Glass-Seal 461
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MP35N Thread Bolt Fastener
MP35N Thread Rod , MP35N bolts , MP35N fasteners , UNS R30035 bolts , MP35N Thread Bar, MP35N Specifications: AMS 5844, AMS 5845, AMS7468, ASTM F562, NACE MR0175. MP35N alloys are used in fasteners, springs, non-magnetic assemblies and instrumentation components in medical, marine, oil and gas well, chemical and food processing environments.
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Titanium Or Molybdenum(Mo)Sputtering Target For Photoelectron And Semiconductor/Molybdenum Target

Molybdenum Titanium Sputtering Target American Elements

About Molybdenum Titanium Sputtering Target American Elements specializes in producing high purity Molybdenum Titanium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Molybdenum Titanium (Mo/Ti) Sputtering Target Specialized

The relative atomic mass of molybdenum is (2) Dalton, the number in the brackets indicating the uncertainty. Related Product: Molybdenum (Mo) Sputtering Target. Titanium. Titanium is a chemical element originated from Titans, the sons of the Earth goddess of Greek mythology. It was first mentioned in 1791 and observed by W. Gregor.

Titanium or molybdenum(MO)sputtering target for photoelectron

Molybdenum(MO)sputtering target of Product Introduction We manufacture high quality sputtering targets in pure metals, alloys, and ceramic materials. We usually adopt Vacuum Melting or Hot Isostatic Pressing (HIP) to produce metalalloy targets and Hot Pressed Sintering for ceramic targets.

Titanium (Ti) Sputtering Target Stanford Advanced Materials

Planar and Rotary Molybdenum Sputtering Target. Our planar titanium sputtering targets have high purity density and uniform microstructure that can be perfectly applied in depositing thin films in TFT displays and other related industries. Both of single and multi-piece molybdenum planar targets are available.

Molybdenum Sputtering Targets

Molybdenum sputtering target can be used as thin-film solar cell electrode, wiring material and barrier layer material of semiconductor. Composition: Pure molybdenum sputtering targets Mo % Molybdenum alloy sputtering targets Molybdenum Niobium (Mo-Nb) Sputtering Targets: 90at% Mo:10at% Nb

Molybdenum (MO) Sputtering Target for Photoelectron and

On Post Sourcing Request. Zhongzheng Yejin Technology ,

good molybdenum price,molybdenum mo sputtering target

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molybdenum mo sputtering target

offers 325 molybdenum mo sputtering target products. About 62% of these are other metals metal products, 35% are molybdenum, and 1% are rare earth products. A wide variety of molybdenum mo sputtering target options are available to you, such as free samples.

Sputtering Molybdenum Target, Sputtering Molybdenum

A wide variety of sputtering molybdenum target options are available to you, such as free samples. There are 735 sputtering molybdenum target suppliers, mainly located in Asia. The top supplying countries or regions are China, Austria, and South Korea, which supply 99%, 1%, and 1% of sputtering molybdenum target respectively.

Molybdenum Target, Molybdenum Target Suppliers and

offers 1,067 molybdenum target products. About 61% of these are other metals metal products, 1% are other titanium, and 1% are other shooting products. A wide variety of molybdenum target options are available to you, such as free samples. There are 1,064 molybdenum target suppliers, mainly located in Asia.

Molybdenum Plansee

Plansee sputtering targets made of molybdenum are available in form of Because: Metallic and gaseous impurities in the sputtering target are semiconductor base plates and x-ray targets in-house using the PVD, CVD, We produce rotary targets of up to four meters in length on reusable steel or titanium backing tubes

Molybdenumniobium Plansee

Molybdenum-niobium (MoNb) is used in touchpanels as particularly Titanium and zirconium Molybdenum Molybdenum-sodium Molybdenum-niobium From the purest metal powder through to the finished sputtering target. such as semiconductor base plates and x-ray targets in-house using the PVD, CVD, APS

Target Molybdenum

1545 products Molybdenum Sputtering Target for Coating Mo Target .. Molybdenum (MO) Sputtering Target for Photoelectron and Semiconductor/Molybdenum

Molybdenum Mo Sputtering Targets Kurt J. Lesker Company

Molybdenum (Mo) Sputtering Targets Overview. Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by

Adhesion Improvement and Characterization of Magnetron

28 Jun 2016 Molybdenum (Mo) thin films are widely used as rear electrodes in copper indium gallium The challenge in Mo deposition by magnetron sputtering lies in for CIGS solar cells, including Au, Ag, Ni, Mo, Ti, Cu, and Al [11–17]. the power applied to the Mo target and the chamber pressure [23, 24].

Sputtering Targets Deposition Materials Semicore Equipment

Semicore offers a wide assortment of sputtering targets and thin film We supply the most commonly requested target shapes - round, rectangular, Ring, including gold sputtering targets, titanium-aluminum, vanadium molybdenum and .. thin film deposition manufacturing process at the heart of todays semiconductors,

Sputtering Targets Testbourne Ltd

Most sputtering target materials can be fabricated into a wide range of Nowadays applications of sputtering range from semiconductor industry for Aluminium Al, Aluminium-Titanium Al-Ti, Chromium Cr, Chromium-Molybdenum Cr-Mo,

Deposition of Visible Light Active Photocatalytic Bismuth

22 Jan 2016 It was found that coatings with a Bi:Mo ratio of approximately 2:1 This is due to the fact that, being a wide band gap semiconductor, titanium dioxide can be target fitted on one of the magnetrons and molybdenum target on the other The target powers were varied systematically in the range from 100 to

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