About Molybdenum Titanium Sputtering Target American Elements specializes in producing high purity Molybdenum Titanium Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
The relative atomic mass of molybdenum is (2) Dalton, the number in the brackets indicating the uncertainty. Related Product: Molybdenum (Mo) Sputtering Target. Titanium. Titanium is a chemical element originated from Titans, the sons of the Earth goddess of Greek mythology. It was first mentioned in 1791 and observed by W. Gregor.
Molybdenum(MO)sputtering target of Product Introduction We manufacture high quality sputtering targets in pure metals, alloys, and ceramic materials. We usually adopt Vacuum Melting or Hot Isostatic Pressing (HIP) to produce metalalloy targets and Hot Pressed Sintering for ceramic targets.
Planar and Rotary Molybdenum Sputtering Target. Our planar titanium sputtering targets have high purity density and uniform microstructure that can be perfectly applied in depositing thin films in TFT displays and other related industries. Both of single and multi-piece molybdenum planar targets are available.
Molybdenum sputtering target can be used as thin-film solar cell electrode, wiring material and barrier layer material of semiconductor. Composition: Pure molybdenum sputtering targets Mo % Molybdenum alloy sputtering targets Molybdenum Niobium (Mo-Nb) Sputtering Targets: 90at% Mo:10at% Nb
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offers 325 molybdenum mo sputtering target products. About 62% of these are other metals metal products, 35% are molybdenum, and 1% are rare earth products. A wide variety of molybdenum mo sputtering target options are available to you, such as free samples.
A wide variety of sputtering molybdenum target options are available to you, such as free samples. There are 735 sputtering molybdenum target suppliers, mainly located in Asia. The top supplying countries or regions are China, Austria, and South Korea, which supply 99%, 1%, and 1% of sputtering molybdenum target respectively.
offers 1,067 molybdenum target products. About 61% of these are other metals metal products, 1% are other titanium, and 1% are other shooting products. A wide variety of molybdenum target options are available to you, such as free samples. There are 1,064 molybdenum target suppliers, mainly located in Asia.
Plansee sputtering targets made of molybdenum are available in form of Because: Metallic and gaseous impurities in the sputtering target are semiconductor base plates and x-ray targets in-house using the PVD, CVD, We produce rotary targets of up to four meters in length on reusable steel or titanium backing tubes
Molybdenum-niobium (MoNb) is used in touchpanels as particularly Titanium and zirconium Molybdenum Molybdenum-sodium Molybdenum-niobium From the purest metal powder through to the finished sputtering target. such as semiconductor base plates and x-ray targets in-house using the PVD, CVD, APS
1545 products Molybdenum Sputtering Target for Coating Mo Target .. Molybdenum (MO) Sputtering Target for Photoelectron and Semiconductor/Molybdenum
Molybdenum (Mo) Sputtering Targets Overview. Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by
28 Jun 2016 Molybdenum (Mo) thin films are widely used as rear electrodes in copper indium gallium The challenge in Mo deposition by magnetron sputtering lies in for CIGS solar cells, including Au, Ag, Ni, Mo, Ti, Cu, and Al [11–17]. the power applied to the Mo target and the chamber pressure [23, 24].
Semicore offers a wide assortment of sputtering targets and thin film We supply the most commonly requested target shapes - round, rectangular, Ring, including gold sputtering targets, titanium-aluminum, vanadium molybdenum and .. thin film deposition manufacturing process at the heart of todays semiconductors,
Most sputtering target materials can be fabricated into a wide range of Nowadays applications of sputtering range from semiconductor industry for Aluminium Al, Aluminium-Titanium Al-Ti, Chromium Cr, Chromium-Molybdenum Cr-Mo,
22 Jan 2016 It was found that coatings with a Bi:Mo ratio of approximately 2:1 This is due to the fact that, being a wide band gap semiconductor, titanium dioxide can be target fitted on one of the magnetrons and molybdenum target on the other The target powers were varied systematically in the range from 100 to