Our purity of Molybdenum Sputtering Target can rich up to %. You can easily purchase it at a great price. Click and find out more.
Sputtering High Purity % Mo Target Molybdenum for Vacuum Coating Loyaltarget provide sputtering targets, evaporation sources and other deposition materials.
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The denser the molybdenum target is, the better the conductivity of the created layer. SAM specializes in producing high purity Molybdenum Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in the PVD, CVD, APS and VPS coating processes. Application of Molybdenum Sputtering Target
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Molybdenum, Molybdenum Target, Mo Sputtering Target manufacturer / supplier in China, offering Mo Coating Sputtering Target % Molybdenum Coating, PVD Coating Materials Chromium Cathode Arc Target Chromium Target, Molybdenum Tantalum (mota) Sputtering Target Pure Sputtering Molybdenum and so on.
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% Pure Mo Molybdenum for Sputtering Target Loyaltarget provide sputtering targets, evaporation sources and other deposition materials.
Haohai Metal offers molybdenum sputtering target, high purity, monolithic, rotatable, hip, custom made, cathodic arc, pvd coating, thin film deposition, magnetron mo sputtering Mo (Mo1, Mo2, TZM). Purity. 3N5 (%). Density. g/cm3. Grain Sizes Vacuum Melting, HIP, Plasma Spraying, Machining, Bonding.
High Purity (%) Molybdenum (Mo) Sputtering Target American Elements specializes in producing high purity Molybdenum Sputtering Targets with the
647 products Molybdenum Disc Target for Vacuum Sputtering Coating .. High Pure % Molybdenum/Mo Sputter/Sputtering Target for PVD Coating. Min.
China % Pure Mo/Molybdenum Sputtering Target Metal Molybdenum for Coating, Molybdenum Sputtering Target, Sputtering Target Molybdenum from % Pure Vacuum electron beam furnace, vacuum induction melting furnace, forging Weve been invested by the National Fund for High-end Equipment.
film thickness monitor - controller, targets, vacuum pumps, dualvacset, rotary High purity disk type sputter targets for the Cressington 108 and 208 series are the highest purity and best selection available for EM sputter coating. 8073, Molybdenum Target, % Mo (?57mm x ) (208HR only), each,
High purity disk type sputter targets for a wide variety of sputter or ion coater . 8073, Molybdenum Target, % Mo (?57mm x ), each, .. SE yield than Au or Pt. Coating can tarnish if samples are not stored under vacuum.
Tell us what vacuum deposition equipment you are using and we can provide you the specifications you need. We supply pure PVD metal targets including gold sputtering targets, titanium-aluminum, the best alloys and compounds to meet your exact thin film coating specifications. MOLYBDENUM, Mo, x, x, x, %.
PVD describes a variety of vacuum deposition methods that can be used to produce (PVD) Sputtering is a physical process where a target material used as the coating Oxygen-Free High Conductivity Copper (OFHC); Molybdenum ( Mo) Pure Metals and Non-Metals (Ceramics); Carbides, Oxides, Borides and Nitrides
Molybdenum Mo Sputtering Targets. Material, Size, Purity, Compatible Guns Molybdenum, Dia. x Thick, %, Most Standard Guns, 1
In planar sputter targets, target utilization for normal cathodes can reach 25%, The high up-time of the equipment reduces the coating cost of each to reach the required vacuum atmosphere) lead in-line systems in general to .. in % purity DC-sputtered and electron-beam evaporated molybdenum thin films  .