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Hastelloy C 276 Electrode For Flowmeter
Hastelloy electrodes for magnetic flow meter. The electrodes widely used for electromagnetic flow meter producing, we can customized according your requirements. 316L electrode , Titanium electrode ,Tantalum electrode ,Hastelloy-C electrode.
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Hastelloy C22 Pipe fittings
Hastelloy C 22 Pipe fittings ( Short Radius Elbows , Long Radius Elbows , Concentric Reducers , Eccentric Reducers , Stub Ends , End Caps , Equal Tees , Weldolets , Pipe Nipples .) ASME/ANSI B16.9, ASME B16.28, MSS-SP-43, MSS SP-79 , Type Seamless / Welded / Fabricated . Hastelloy C-22 / UNS N06022 / DIN W. Nr. 2.4602
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Hastelloy C 276 Pipe fittings
Hastelloy C 276 Pipe fittings ( Short Radius Elbows , Long Radius Elbows , Concentric Reducers , Eccentric Reducers , Stub Ends , End Caps , Equal Tees , Weldolets , Pipe Nipples .) ASME/ANSI B16.9, ASME B16.28, MSS-SP-43, MSS SP-79 , Type Seamless / Welded / Fabricated Hastelloy C276 Pipe Fittings UNS (N10276), DIN (2.4819).
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Inconel 625 Rod
Inconel Round Bar , ASTM B446 Inconel, 625 Bright Round Rod , Inconel 625 Hex Rods ,Inconel 625 flat bar with standard ASTM B446 / ASME SB446 and Nickel Alloy 625/ Inconel 625 (AMS 5666)
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Inconel 601 Welding Wire
Inconel 601 Welding Wire - UNS N06601 - DIN W. Nr.2.4851 . ERNiCrFe-11 (Alloy 601) . ASME II, Part C, SFA-5.14, ERNiCrFe-11 (UNS N06601) , ASME IX, F-No.43 , BS290] NA 49 , DIN 1736 SG-NiCr23Al (2.4626) , (EN) ISO 18274 - SN16601 (NiCr23Fel5Al) , ASME III (NCA3800, NB2400), AMS and other specifications
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Inconel 600 Welding Wire
Inconel 600 Wire ASTM B166 , Inconel 600 welding wire Alloy 600. UNS N06600 / W.Nr. 2.4816 .Nickel Alloy (AWS A5.11) ENiCrFe-3 Welding Electrode, Nickel Alloy ENiCrFe-3 Welding Electrode, ENiCrFe-3 inconel 600
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Invar 32 Wire
Invar 32 Wire Super-Invar 32-5 rod UNS-K-93500, Consisting of 32% Nickel, 5% Cobalt, and the balance Iron, this alloy exhibits minimum thermal expansion (one half of Invar 36) at room temperature. It is often used in structural components, supports and substrates requiring precision measurements. ASTM F1684.
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Invar 32 Sheet
Invar 32 Sheet, plate , Invar Alloy Foil , Super Invar 32-5 Alloy DESCRIPTION. A low expansion alloy consisting of 32% Nickel, 5% Cobalt, balance Iron. This alloy exhibits minimum thermal expansion (one half of Invar 36) Invar-36, Invar-42, Pernifer 36, Invar Steel, Super Invar 32-5, Carpenter 36, 4J32, 4J36
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Invar 36 Plate
Alloy 36 Sheet (Invar) / K93603 / ASTM F1684 Widely known under several trades names such as Invar and Nilo 36**, this grade is a 36% nickel-iron alloy. AMS l-23011 CL7MIL l-23011 CL7UNS K93602/03 4J36 (China), Fe-Ni36 (France), 1.3912, Ni36 (Germany), X1NiCrMoCu, N 25-20-7 (UK) Invar 36, UNSK93600 thermostat alloy, UNSK93601 pressure vessel sheet (USA)
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Alloy 46 Wire
Alloy 46 wire : Consisting of 46% nickel and iron balance, 46 Alloy is a controlled expansion alloy used mostly in electronic applications, especially for glass and ceramic seals. Alloy 46 is also known as Pernifer 462, NILO 464, and Glass-Seal 461 , ,Fe46Ni
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Alloy 46 Sheet
Alloy 46: Consisting of 46% nickel and iron balance, 46 Alloy is a controlled expansion alloy used mostly in electronic applications, especially for glass and ceramic seals. Alloy 46 is also known as Pernifer 462, NILO 464, and Glass-Seal 461
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MP35N Thread Bolt Fastener
MP35N Thread Rod , MP35N bolts , MP35N fasteners , UNS R30035 bolts , MP35N Thread Bar, MP35N Specifications: AMS 5844, AMS 5845, AMS7468, ASTM F562, NACE MR0175. MP35N alloys are used in fasteners, springs, non-magnetic assemblies and instrumentation components in medical, marine, oil and gas well, chemical and food processing environments.
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Polished Surface Molybdenum Target Used In Plasma Sputtering Industry

Molybdenum target is mainly used in plasma sputtering industry

Molybdenum target is mainly used in plasma sputtering industry。 With the electric field, electron collided with the argon atom when fly to the substrate, then argon atoms and electrics were ionized .The electrics fly to the substrate while argon atoms accelerate to bomb the target, the neutral atoms (or molecules) in the target deposit on the substrate and become the coating.

Molybdenum Target Bango Alloy

Applications of Molybdenum target Molybdenum target is mainly used in plasma sputtering industry. With the electric field, electron collided with the argon atom when fly to the substrate, then argon atoms and electrics were ionized .The electrics fly to the substrate while argon atoms accelerate to bomb the target, the neutral atoms (or molecules) in the target deposit on the substrate and become the coating.

What Are the Uses of Molybdenum in Coating Industry?

Molybdenum targets can be used with other target materials in sputtering or other technological conditions, which are widely used in semiconductor wiring, medical treatment, mechanical processing and solid lubrication. Another important application of molybdenum in coating industry is spraying.

Molybdenum Sputtering Target Stanford Materials

Molybdenum sputtering target is widely used in manufacturing LCD and touch screens (panels). It is also used for solar cells and solar water heating. We can provide pure molybdenum and molybdenum alloy targets with different shapes, including disc, planar, rotary as well as custom targets.

Molybdenum Sputtering Target Buy molybdenum target

Molybdenum Sputtering Target Molybdenum sputtering targets are mainly used in plasma sputtering industry. With the electric field, electron is collided with the argon atom when fly to the substrate, then argon atoms and electrics are ionized.

Molybdenum Target Weison Advanced Materials Co

With the electric field, electron collided with the argon atom when fly to the substrate, then argon atoms and electrics were ionized .The electrics fly to the substrate while argon atoms accelerate to bomb the target, the neutral atoms (or molecules) in the target deposit on the substrate and become the coating. petroleum chemical industry, aviation, machine manufacturing, and electronics semiconductor industries and so on.

Applications of Molybdenum target Sputtering Targets for

Molybdenum target possesses high melting point, high strength, low thermal expansion coefficient, low resistivity and good thermal qualitative and low-temperature oxidation resistance, molybdenum target is mainly used in plasma sputtering industry.

Molybdenum Target Applications

Molybdenum target is mainly used in plasma sputtering industry. With the electric field, electron collided with the argon atom when fly to the substrate, then argon atoms and electrics were ionized .The electrics fly to the substrate while argon atoms accelerate to bomb the target, the neutral atoms (or molecules) in the target deposit on the substrate and become the coating.

Molybdenum sputtering targets. Plansee

Molybdenum sputtering targets. Molybdenum coatings are the crucial components of the thin-film transistors used in TFT-LCD screens. These provide instantaneous control of the individual image dots (pixels) and consequently ensure particularly sharp image quality. Molybdenum layers are also used as back s in CIGS solar cells.

Molybdenum Target,China Molybdenum Target Price

Molybdenum target is mainly used in plasma sputtering industry. Since the molybdenum resistant to high temperature and corrosion, it is widely used in petroleum chemical industry, aviation, machine manufacturing, and electronics semiconductor industries and so on.

Sputter Deposition an overview ScienceDirect Topics

The technique is based on ion bombardment of a source material, the target. The plasma used in sputtering can be confined near the sputtering surface or for preparing thin films of alloys and complex materials for industrial application. .. DC magnetron reactive sputtering method revealed an extremely smooth surface

Deposition and Characterization of Molybdenum Thin Film

29 Dec 2016 The surface profiler has been used to measure the surface Smooth surface has been observed. These systems have a rising importance in the automotive industry, DC magnetron sputtering which is a method of physical vapor In DC magnetron sputtering process, pure molybdenum round target

Characterization of Hydroxyapatite (HA) Sputtering MDPI

11 Nov 2017 method for applying HA sputtering for the surface modification of The target used in the APS process was manufactured by plasma spraying HA powder directly onto a copper backing plate .. Acknowledgments: Part of this study was conducted by industry-university cooperative research with Chang.

Study of Plasma and Ion Beam Sputtering Processes David

ion beam extraction from a plasma source for sputtering process by using a .. energetic ion collides with a target surface and has at . surface. DC sputtering is used extensively in the electronics industry to .. The topography of the mechanically polished surface is . as aluminum, copper, iron, zinc and finally for Pb.

Tracing the Recorded History of ThinFilm Sputter AVS

Two additional forms of magnetron sputtering evolved during the . decorative purposes, remained a viable industry for craftsmen until the development, in . atoms are ionized by a dc potential applied between the copper target and .. with a polished electroplated silver surface, and a rod, which passed through a leather.

Sputter deposition

Sputter deposition is a physical vapor deposition (PVD) method of thin film deposition by sputtering. This involves ejecting material from a target that is a source onto a The compound can be formed on the target surface, in-flight or on the Sputtering is used extensively in the semiconductor industry to deposit thin films

84 questions with answers in DC Sputtering Science topic

This defect ordering creates interesting phenomena on surface, and mixed . For materials that are easy to sputter (like copper), even classical DC When low DC voltage is applied to the Silver target, the plasma flux gets bent (an image .. self-flux Ni alloy coatings as used in the glass moulds industry (I suggest you in

Magnetron Sputtering Overview Angstrom Engineering

Magnetron sputtering is a plasma based thin film deposition process where atoms are We helped pioneer this display technology, and remain the industrys The surface of the target is eroded by high-energy ions within the plasma, and the To initiate plasma generation, high voltage is applied between the cathode

Magnetron Sputtering Technique Springer Link

presented followed by some industrial applications, practical aspects, com- The so-called magnetron sputtering technique has been used as a coating method since as . with the angle of ion incidence θ to the target surface normal ( Sigmund 1968): Mo. . Ni. . Pt. . Si. . Ta. . Ti. . W. . 2934.

Fabrication of highquality singlecrystal Cu thin films using

29 Aug 2014 Copper (Cu) thin films have been widely used as electrodes and films using a single-crystal Cu target and radio-frequency (RF) sputtering technique; substrate, making our findings relevant for industrial applications. . a very clean surface, similar to that of a polished bulk single crystal, was observed.

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