High Purity Molybdenum Tungsten Tantalum Nibium Zirconium Hafnium Titanium Sputtering Targets For Pvd Coating , Find Complete Details about High Purity Molybdenum Tungsten Tantalum Nibium Zirconium Hafnium Titanium Sputtering Targets For Pvd Coating,Sputtering Targets,Molybdenum Price Per Kg,Pvd Coating from Other Metals Metal Products Supplier or Manufacturer-Baoji Kedipu New Material ,
MG metal specializes in producing high purity Tungsten Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
New design platinum sputtering target with high quality Technical Data It em Name New design sputtering target with high quality Purity % Impurity content % Grain Size 100m Technics Powder metallurgy Shape Ingot, Sputtering Targets, Disk, Plate, Sheet, Foil, Wire , according to your request Available size Round: dia 25~400mm Rectangular: length up to 1500mm Customization is available Application Widely used in coating processing industries such as optical data storage
High material purity. Metallic and gaseous impurities in the sputtering target are reproduced almost 1:1 in the sputtered functional layer and result in particle formation during the PVD process (arcing effect). Sputtering targets made from high-purity materials are therefore required for the coating process.
Exotech buys and recycles exotic metals including Tantalum, Niobium, Zirconium, Hafnium and other minor metals. We specialize in recycling sputter targets and the most challenging types of solids, turnings, grindings and powders
Tantalum, Niobium, Tantalum Tungsten Alloy, Tantalum Niobium Alloy, Niobium zirconium Alloy materials Why Choose US？ company was specialized in tungsten, molybdenum, tantalum, niobium and other non-ferrous metals, with more than 10 years experience in their production, processing, and researchment.
High purity 5% metal alloy Cobalt Tantalum Zirconium Sputtering Target Product introduction Product name High purity 5% metal alloy Cobalt Tantalum Zirconium Sputtering Target Standard ASTM B708 Application industry,medical,chemical,aerospace,electricity, Package Wooden case is outside, inside is plastic and paper Delivery time 7 -10 Days Payment L/C,D/A,D/P,T/T, Western Union, MoneyGram, Escrow MOQ 1KG Supply ability 1000KG per month Process forged Ta content(%) 5 Chemical
Tungsten, molybdenum, tantalum, niobium Advanced metals and alloys. Titanium, zirconium, nickel, hafnium Thin-film products. Sputtering targets, evaporation materials. The company was founded in 2007 and has gained a significant growth since its establishment. We are committed to a win-win business with our customers.
offers 131 titanium zirconium target products. About 67% of these are other metals metal products, 17% are other titanium. A wide variety of titanium zirconium target options are available to you,
Hexonmetal is a specialized supplier of high melting metal as like Molybdenum, Zirconium, Tungsten, Hafnium, Nickel and Tantalum. These kinds of metal is use for various fields as aerospace, automotive, Chemical process, defense and military, electronic electrical, Titanium for biomedical, nuclear, oil and gas, thin-film deposition.
Angstrom Sciences offers a selection of high-purity vacuum deposition materials PVD Materials. Sputtering Targets, Evaporation Material, Angstrom Sciences Hafnium Carbide Lead Zirconium Titanate Oxide Strontium Bismuth Tantalum Niobium Tungsten. Tungsten Silicide. Tungsten Sulfide. Tungsten Titanium.
Our targets and cathodes made from titanium-aluminum (TiAl) ensure that drills, milling Theres one thing we know perfectly well: In the PVD coating process, Only through the perfect combination of high-quality sputtering targets and arc stability, for example, we add niobium, tantalum, molybdenum or tungsten.
Semicore offers a wide assortment of sputtering targets and thin film grade % purity to the highest, 99% zone refined Ultra-Pure grade. We supply pure PVD metal targets including gold sputtering targets, titanium-aluminum, vanadium molybdenum and niobium alloy compound targets, rotatable targets as well
sputtering targets in niobium, titanium, tungsten, molybdenum, hafnium, Sputtering is a physical vapor deposition (PVD) mechanism in which atoms The target materials can be pure metals, alloys or compounds such as oxides or nitrides. and materials with very high melting points such as tantalum (melting point
High quality Umicore materials play a major role in the efficiency of the Aluminium oxide; Cerium oxide; Chromium oxide; Hafnium oxide; ITO; Lida Zirconium monoxide; Zirconium dioxide; Roma; Zirconium-Titanium oxide Molybdenum; Nickel; Niobium; Silicon; Tantalum; Tin; Titanium; Tungsten; Yttrium ; Zirconium.
274 products offers 274 zirconium sputtering target products. High purity Tungsten Molybdenum Tantalum Nibium Zirconium Hafnium Titanium sputtering PVD coating materials Low hafnium content Zr zirconium metal sputtering target . high purity titanium aluminium zirconium chrome sputtering target.
Our specialty sputtering thin film target materials include Au, Pt, Pd, Al, AlSiCu, AlCu, Cu, Ti, Ni, Ta, Nb, WSi, MoSi, NiPt, TiAl and WTi - in all target shapes and sizes VEMs stringent quality standards ensure high quality targets resulting in In addition, we povide a wide assortment of PVD precious metal alloys - Gold
Our product portfolio, ranging from high purity PVD sputtering targets to evaporation materials, spans the periodic table and we have an experienced technical
A high purity material used as a source for sputtering, a cold vaporization process in atoms are physically removed from the target surface by ion bombardment. Hafnium Oxide ( HfO2 ) Nickel/Iron/Molybdenum ( Ni80//Mo ) Niobium ( Nb ) Tantalum Pentoxide ( Ta2O5 ) Tungsten/Titanium ( W 90/Ti10 ).
American Elements, a global manufacturer and distributor of sputtering targets evaporation materials.