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Hastelloy C 276 Electrode For Flowmeter
Hastelloy electrodes for magnetic flow meter. The electrodes widely used for electromagnetic flow meter producing, we can customized according your requirements. 316L electrode , Titanium electrode ,Tantalum electrode ,Hastelloy-C electrode.
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Hastelloy C22 Pipe fittings
Hastelloy C 22 Pipe fittings ( Short Radius Elbows , Long Radius Elbows , Concentric Reducers , Eccentric Reducers , Stub Ends , End Caps , Equal Tees , Weldolets , Pipe Nipples .) ASME/ANSI B16.9, ASME B16.28, MSS-SP-43, MSS SP-79 , Type Seamless / Welded / Fabricated . Hastelloy C-22 / UNS N06022 / DIN W. Nr. 2.4602
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Hastelloy C 276 Pipe fittings
Hastelloy C 276 Pipe fittings ( Short Radius Elbows , Long Radius Elbows , Concentric Reducers , Eccentric Reducers , Stub Ends , End Caps , Equal Tees , Weldolets , Pipe Nipples .) ASME/ANSI B16.9, ASME B16.28, MSS-SP-43, MSS SP-79 , Type Seamless / Welded / Fabricated Hastelloy C276 Pipe Fittings UNS (N10276), DIN (2.4819).
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Inconel 625 Rod
Inconel Round Bar , ASTM B446 Inconel, 625 Bright Round Rod , Inconel 625 Hex Rods ,Inconel 625 flat bar with standard ASTM B446 / ASME SB446 and Nickel Alloy 625/ Inconel 625 (AMS 5666)
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Inconel 601 Welding Wire
Inconel 601 Welding Wire - UNS N06601 - DIN W. Nr.2.4851 . ERNiCrFe-11 (Alloy 601) . ASME II, Part C, SFA-5.14, ERNiCrFe-11 (UNS N06601) , ASME IX, F-No.43 , BS290] NA 49 , DIN 1736 SG-NiCr23Al (2.4626) , (EN) ISO 18274 - SN16601 (NiCr23Fel5Al) , ASME III (NCA3800, NB2400), AMS and other specifications
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Inconel 600 Welding Wire
Inconel 600 Wire ASTM B166 , Inconel 600 welding wire Alloy 600. UNS N06600 / W.Nr. 2.4816 .Nickel Alloy (AWS A5.11) ENiCrFe-3 Welding Electrode, Nickel Alloy ENiCrFe-3 Welding Electrode, ENiCrFe-3 inconel 600
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Invar 32 Wire
Invar 32 Wire Super-Invar 32-5 rod UNS-K-93500, Consisting of 32% Nickel, 5% Cobalt, and the balance Iron, this alloy exhibits minimum thermal expansion (one half of Invar 36) at room temperature. It is often used in structural components, supports and substrates requiring precision measurements. ASTM F1684.
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Invar 32 Sheet
Invar 32 Sheet, plate , Invar Alloy Foil , Super Invar 32-5 Alloy DESCRIPTION. A low expansion alloy consisting of 32% Nickel, 5% Cobalt, balance Iron. This alloy exhibits minimum thermal expansion (one half of Invar 36) Invar-36, Invar-42, Pernifer 36, Invar Steel, Super Invar 32-5, Carpenter 36, 4J32, 4J36
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Invar 36 Plate
Alloy 36 Sheet (Invar) / K93603 / ASTM F1684 Widely known under several trades names such as Invar and Nilo 36**, this grade is a 36% nickel-iron alloy. AMS l-23011 CL7MIL l-23011 CL7UNS K93602/03 4J36 (China), Fe-Ni36 (France), 1.3912, Ni36 (Germany), X1NiCrMoCu, N 25-20-7 (UK) Invar 36, UNSK93600 thermostat alloy, UNSK93601 pressure vessel sheet (USA)
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Alloy 46 Wire
Alloy 46 wire : Consisting of 46% nickel and iron balance, 46 Alloy is a controlled expansion alloy used mostly in electronic applications, especially for glass and ceramic seals. Alloy 46 is also known as Pernifer 462, NILO 464, and Glass-Seal 461 , ,Fe46Ni
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Alloy 46 Sheet
Alloy 46: Consisting of 46% nickel and iron balance, 46 Alloy is a controlled expansion alloy used mostly in electronic applications, especially for glass and ceramic seals. Alloy 46 is also known as Pernifer 462, NILO 464, and Glass-Seal 461
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MP35N Thread Bolt Fastener
MP35N Thread Rod , MP35N bolts , MP35N fasteners , UNS R30035 bolts , MP35N Thread Bar, MP35N Specifications: AMS 5844, AMS 5845, AMS7468, ASTM F562, NACE MR0175. MP35N alloys are used in fasteners, springs, non-magnetic assemblies and instrumentation components in medical, marine, oil and gas well, chemical and food processing environments.
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High Purity Tungsten Molybdenum Tantalum Nibium Zirconium Hafnium Titanium Sputtering Targets For Pvd

High Purity Molybdenum Tungsten Tantalum Nibium Zirconium

High Purity Molybdenum Tungsten Tantalum Nibium Zirconium Hafnium Titanium Sputtering Targets For Pvd Coating , Find Complete Details about High Purity Molybdenum Tungsten Tantalum Nibium Zirconium Hafnium Titanium Sputtering Targets For Pvd Coating,Sputtering Targets,Molybdenum Price Per Kg,Pvd Coating from Other Metals Metal Products Supplier or Manufacturer-Baoji Kedipu New Material ,

High Purity Tungsten Molybdenum Tantalum Nibium Zirconium

MG metal specializes in producing high purity Tungsten Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

High Purity Zirconium Targets, High Purity Zirconium Targets

New design platinum sputtering target with high quality Technical Data It em Name New design sputtering target with high quality Purity % Impurity content % Grain Size 100m Technics Powder metallurgy Shape Ingot, Sputtering Targets, Disk, Plate, Sheet, Foil, Wire , according to your request Available size Round: dia 25~400mm Rectangular: length up to 1500mm Customization is available Application Widely used in coating processing industries such as optical data storage

Tungsten sputtering target. Plansee

High material purity. Metallic and gaseous impurities in the sputtering target are reproduced almost 1:1 in the sputtered functional layer and result in particle formation during the PVD process (arcing effect). Sputtering targets made from high-purity materials are therefore required for the coating process.

Exotech Exotic Scrap Metal Recycling Tantalum Niobium

Exotech buys and recycles exotic metals including Tantalum, Niobium, Zirconium, Hafnium and other minor metals. We specialize in recycling sputter targets and the most challenging types of solids, turnings, grindings and powders

Tungsten,Molybdenum,Titanium,Tantalum, Niobium,Zirconium,Hafnium

Tantalum, Niobium, Tantalum Tungsten Alloy, Tantalum Niobium Alloy, Niobium zirconium Alloy materials Why Choose US? company was specialized in tungsten, molybdenum, tantalum, niobium and other non-ferrous metals, with more than 10 years experience in their production, processing, and researchment.

Zirconium Sputtering Target, Zirconium Sputtering Target

High purity 5% metal alloy Cobalt Tantalum Zirconium Sputtering Target Product introduction Product name High purity 5% metal alloy Cobalt Tantalum Zirconium Sputtering Target Standard ASTM B708 Application industry,medical,chemical,aerospace,electricity, Package Wooden case is outside, inside is plastic and paper Delivery time 7 -10 Days Payment L/C,D/A,D/P,T/T, Western Union, MoneyGram, Escrow MOQ 1KG Supply ability 1000KG per month Process forged Ta content(%) 5 Chemical

Molybdenum, Zirconium, Tungsten, Hafnium, Nickel, Tantalum

Tungsten, molybdenum, tantalum, niobium Advanced metals and alloys. Titanium, zirconium, nickel, hafnium Thin-film products. Sputtering targets, evaporation materials. The company was founded in 2007 and has gained a significant growth since its establishment. We are committed to a win-win business with our customers.

Titanium Zirconium Target, Titanium Zirconium Target

offers 131 titanium zirconium target products. About 67% of these are other metals metal products, 17% are other titanium. A wide variety of titanium zirconium target options are available to you,

Molybdenum, Zirconium, Tungsten, Hafnium, Nickel, Tantalum

Hexonmetal is a specialized supplier of high melting metal as like Molybdenum, Zirconium, Tungsten, Hafnium, Nickel and Tantalum. These kinds of metal is use for various fields as aerospace, automotive, Chemical process, defense and military, electronic electrical, Titanium for biomedical, nuclear, oil and gas, thin-film deposition.

PVD Materials – Angstrom Sciences High Purity PVD

Angstrom Sciences offers a selection of high-purity vacuum deposition materials PVD Materials. Sputtering Targets, Evaporation Material, Angstrom Sciences Hafnium Carbide Lead Zirconium Titanate Oxide Strontium Bismuth Tantalum Niobium Tungsten. Tungsten Silicide. Tungsten Sulfide. Tungsten Titanium.

Titaniumaluminum Plansee

Our targets and cathodes made from titanium-aluminum (TiAl) ensure that drills, milling Theres one thing we know perfectly well: In the PVD coating process, Only through the perfect combination of high-quality sputtering targets and arc stability, for example, we add niobium, tantalum, molybdenum or tungsten.

Sputtering Targets Deposition Materials Semicore Equipment

Semicore offers a wide assortment of sputtering targets and thin film grade % purity to the highest, 99% zone refined Ultra-Pure grade. We supply pure PVD metal targets including gold sputtering targets, titanium-aluminum, vanadium molybdenum and niobium alloy compound targets, rotatable targets as well

Sputtering Targets Thin Films Admat Inc.

sputtering targets in niobium, titanium, tungsten, molybdenum, hafnium, Sputtering is a physical vapor deposition (PVD) mechanism in which atoms The target materials can be pure metals, alloys or compounds such as oxides or nitrides. and materials with very high melting points such as tantalum (melting point

Evaporation Materials and Coating Materials Umicore

High quality Umicore materials play a major role in the efficiency of the Aluminium oxide; Cerium oxide; Chromium oxide; Hafnium oxide; ITO; Lida Zirconium monoxide; Zirconium dioxide; Roma; Zirconium-Titanium oxide Molybdenum; Nickel; Niobium; Silicon; Tantalum; Tin; Titanium; Tungsten; Yttrium ; Zirconium.

Zirconium Sputtering Target

274 products offers 274 zirconium sputtering target products. High purity Tungsten Molybdenum Tantalum Nibium Zirconium Hafnium Titanium sputtering PVD coating materials Low hafnium content Zr zirconium metal sputtering target . high purity titanium aluminium zirconium chrome sputtering target.

Sputtering Targets Vacuum Engineering and Materials Co

Our specialty sputtering thin film target materials include Au, Pt, Pd, Al, AlSiCu, AlCu, Cu, Ti, Ni, Ta, Nb, WSi, MoSi, NiPt, TiAl and WTi - in all target shapes and sizes VEMs stringent quality standards ensure high quality targets resulting in In addition, we povide a wide assortment of PVD precious metal alloys - Gold

Products Vacuum Engineering and Materials Co

Our product portfolio, ranging from high purity PVD sputtering targets to evaporation materials, spans the periodic table and we have an experienced technical

SputteringTarget Online small quantity sources Index of

A high purity material used as a source for sputtering, a cold vaporization process in atoms are physically removed from the target surface by ion bombardment. Hafnium Oxide ( HfO2 ) Nickel/Iron/Molybdenum ( Ni80//Mo ) Niobium ( Nb ) Tantalum Pentoxide ( Ta2O5 ) Tungsten/Titanium ( W 90/Ti10 ).

Sputtering Targets AMERICAN ELEMENTS ?

American Elements, a global manufacturer and distributor of sputtering targets evaporation materials.

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