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Hastelloy C 276 Electrode For Flowmeter
Hastelloy electrodes for magnetic flow meter. The electrodes widely used for electromagnetic flow meter producing, we can customized according your requirements. 316L electrode , Titanium electrode ,Tantalum electrode ,Hastelloy-C electrode.
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Hastelloy C22 Pipe fittings
Hastelloy C 22 Pipe fittings ( Short Radius Elbows , Long Radius Elbows , Concentric Reducers , Eccentric Reducers , Stub Ends , End Caps , Equal Tees , Weldolets , Pipe Nipples .) ASME/ANSI B16.9, ASME B16.28, MSS-SP-43, MSS SP-79 , Type Seamless / Welded / Fabricated . Hastelloy C-22 / UNS N06022 / DIN W. Nr. 2.4602
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Hastelloy C 276 Pipe fittings
Hastelloy C 276 Pipe fittings ( Short Radius Elbows , Long Radius Elbows , Concentric Reducers , Eccentric Reducers , Stub Ends , End Caps , Equal Tees , Weldolets , Pipe Nipples .) ASME/ANSI B16.9, ASME B16.28, MSS-SP-43, MSS SP-79 , Type Seamless / Welded / Fabricated Hastelloy C276 Pipe Fittings UNS (N10276), DIN (2.4819).
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Inconel 625 Rod
Inconel Round Bar , ASTM B446 Inconel, 625 Bright Round Rod , Inconel 625 Hex Rods ,Inconel 625 flat bar with standard ASTM B446 / ASME SB446 and Nickel Alloy 625/ Inconel 625 (AMS 5666)
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Inconel 601 Welding Wire
Inconel 601 Welding Wire - UNS N06601 - DIN W. Nr.2.4851 . ERNiCrFe-11 (Alloy 601) . ASME II, Part C, SFA-5.14, ERNiCrFe-11 (UNS N06601) , ASME IX, F-No.43 , BS290] NA 49 , DIN 1736 SG-NiCr23Al (2.4626) , (EN) ISO 18274 - SN16601 (NiCr23Fel5Al) , ASME III (NCA3800, NB2400), AMS and other specifications
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Inconel 600 Welding Wire
Inconel 600 Wire ASTM B166 , Inconel 600 welding wire Alloy 600. UNS N06600 / W.Nr. 2.4816 .Nickel Alloy (AWS A5.11) ENiCrFe-3 Welding Electrode, Nickel Alloy ENiCrFe-3 Welding Electrode, ENiCrFe-3 inconel 600
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Invar 32 Wire
Invar 32 Wire Super-Invar 32-5 rod UNS-K-93500, Consisting of 32% Nickel, 5% Cobalt, and the balance Iron, this alloy exhibits minimum thermal expansion (one half of Invar 36) at room temperature. It is often used in structural components, supports and substrates requiring precision measurements. ASTM F1684.
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Invar 32 Sheet
Invar 32 Sheet, plate , Invar Alloy Foil , Super Invar 32-5 Alloy DESCRIPTION. A low expansion alloy consisting of 32% Nickel, 5% Cobalt, balance Iron. This alloy exhibits minimum thermal expansion (one half of Invar 36) Invar-36, Invar-42, Pernifer 36, Invar Steel, Super Invar 32-5, Carpenter 36, 4J32, 4J36
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Invar 36 Plate
Alloy 36 Sheet (Invar) / K93603 / ASTM F1684 Widely known under several trades names such as Invar and Nilo 36**, this grade is a 36% nickel-iron alloy. AMS l-23011 CL7MIL l-23011 CL7UNS K93602/03 4J36 (China), Fe-Ni36 (France), 1.3912, Ni36 (Germany), X1NiCrMoCu, N 25-20-7 (UK) Invar 36, UNSK93600 thermostat alloy, UNSK93601 pressure vessel sheet (USA)
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Alloy 46 Wire
Alloy 46 wire : Consisting of 46% nickel and iron balance, 46 Alloy is a controlled expansion alloy used mostly in electronic applications, especially for glass and ceramic seals. Alloy 46 is also known as Pernifer 462, NILO 464, and Glass-Seal 461 , ,Fe46Ni
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Alloy 46 Sheet
Alloy 46: Consisting of 46% nickel and iron balance, 46 Alloy is a controlled expansion alloy used mostly in electronic applications, especially for glass and ceramic seals. Alloy 46 is also known as Pernifer 462, NILO 464, and Glass-Seal 461
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MP35N Thread Bolt Fastener
MP35N Thread Rod , MP35N bolts , MP35N fasteners , UNS R30035 bolts , MP35N Thread Bar, MP35N Specifications: AMS 5844, AMS 5845, AMS7468, ASTM F562, NACE MR0175. MP35N alloys are used in fasteners, springs, non-magnetic assemblies and instrumentation components in medical, marine, oil and gas well, chemical and food processing environments.
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High Purity 99.97% Molybdenum Target For Sputtering

Technically Superior HighQuality Sputtering Targets

High-Purity Molybdenum Rotatable Targets (3N7 pure) Technically Advanced Sputtering Targets Features Benefits Very high purity formulation that meets the standards of the most demanding applications: FPD, PV-Thin-film electrodes, touch screens.

Titanium (Ti) Sputtering Target Stanford Advanced Materials

Planar and Rotary Molybdenum Sputtering Target. Our planar titanium sputtering targets have high purity density and uniform microstructure that can be perfectly applied in depositing thin films in TFT displays and other related industries. Both of single and multi-piece molybdenum planar targets are available.

% Mos2 High Purity Molybdenum Disulfide For Sputtering

% MoS2 High Purity Molybdenum Disulfide for Sputtering Target Loyaltarget provide sputtering targets, evaporation sources and other deposition materials. Composition: High Purity Molybdenum Disulfide

Molybdenum sputtering targets. Plansee

Because: Metallic and gaseous impurities in the sputtering target are reproduced almost 1:1 in the sputtered functional layer and result in particle formation during the PVD process (arcing effect). We guarantee that our molybdenum targets have a purity of at least %. The average purity of our targets lies at an unbeatable %.

Sputtering High Purity % Mo Target Molybdenum For Vacuum

Sputtering High Purity % Mo Target Molybdenum for Vacuum Coating Loyaltarget provide sputtering targets, evaporation sources and other deposition materials.

Molybdenum Trioxide % High Purity Moo3 Sputtering Target

Molybdenum Trioxide % High Purity Moo3 Sputtering Target , Find Complete Details about Molybdenum Trioxide % High Purity Moo3 Sputtering Target,Moo3 Sputtering Target,Moo3 Target,High Purity Moo3 from Oxide Supplier or Manufacturer-Beijing Loyaltarget Technology , Limited

% Molybdenum Disulfide Sputtering Target High Purity

% Molybdenum Disulfide Sputtering Target High Purity Mos2 For Thin Film Coating , Find Complete Details about % Molybdenum Disulfide Sputtering Target High Purity Mos2 For Thin Film Coating,High Purity Mos2,% Molybdenum Disulfide Sputtering Target,Thin Film Coating from Other Inorganic Chemicals Supplier or Manufacturer-Beijing Loyaltarget Technology , Limited

Molybdenum (Mo) Sputtering Target

The denser the molybdenum target is, the better the conductivity of the created layer. SAM specializes in producing high purity Molybdenum Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in the PVD, CVD, APS and VPS coating processes. Application of Molybdenum Sputtering Target

Chinese Manufacturer Price % High Purity Molybdenum

Molybdenum Target, Molybdenum Sputtering Target, Molybdenum Target Price manufacturer / supplier in China, offering Chinese Manufacturer Price % High Purity Molybdenum Sputtering Target, Titanium Camping Uncoated Small Bowl 400ml Camping Cookware, High-Quality Ultra Light Metal Stainless Titanium Spoon and so on.

Molybdenum Sputtering Target AMERICAN ELEMENTS

About Molybdenum Sputtering Target American Elements specializes in producing high purity Molybdenum Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Molybdenum Plansee

Plansee sputtering targets made of molybdenum are available in form of rotary and Our materials excel due to their high purity and density as well as their We guarantee that our molybdenum targets have a purity of at least %.

Molybdenumniobium Plansee

You can rely on the quality of our MoNb sputtering targets. Purity [%], benefit from extremely high levels of material purity and by using our targets,

Technically Superior HighQuality Sputtering Targets

Rotatable sputtering targets deliver high quality coatings for glass and films and allow high-power sputtering cost-effective solutions, in particular with our ECO- Recycling technology applicable on Molybdenum targets. Purity, %.

Molybdenum Sputtering Target AMERICAN ELEMENTS ?

American Elements specializes in producing high purity Molybdenum Sputtering Targets with the highest possible density and smallest possible average grain

Sputtering Targets AMERICAN ELEMENTS ?

Below is only a limited selection of the full catalog of sputtering targets that .. high density, ultra high purity (% to 999%) sputtering targets and other

Molybdenum Sputtering Targets Elmet Technologies

Elmet Technologies high-quality tungsten, molybdenum, and alloy based sputtering targets and consumables aid the FPD and IC industry in increasing

Sputtering target Shenzhen Sunrise Metal Industry ,Ltd

%, 5%, 9% High Purity Chromium Sputtering Target. Specifications Density:/cm3 Purity:5%.% meterial:Mo1,TZM,Mo-La. Surface:

Thin Film Materials : Sputtering Targets / Tablets for Vapor

Thin film materials: Detailed information on sputtering targets / tablets for vapor deposition. SMM produces thin film materials using internally-produced, high- purity metals, high-purity nickel-cobalt Electrode film, Al and Al alloy, Ta, Mo, Cr .

Sputtering Targets Deposition Materials Semicore

We supply pure PVD metal targets including gold sputtering targets, vanadium molybdenum and niobium alloy compound targets, rotatable targets as well as .. energy, medical, automotive, military and related high technology industries.

EMTec high purity Disc sputtering targets and Annular Sputter

?60mm disc type high purity EM-Tec sputter targets for sputter coaters; ?57mm disc type high purity EM-Tec sputter . 70-AG6010, Silver Target, ?60 x Disc, % Ag . 70-CU5710, Copper Target, ?57 x Disc, 9% Cu.

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