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Hastelloy C 276 Electrode For Flowmeter
Hastelloy electrodes for magnetic flow meter. The electrodes widely used for electromagnetic flow meter producing, we can customized according your requirements. 316L electrode , Titanium electrode ,Tantalum electrode ,Hastelloy-C electrode.
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Hastelloy C22 Pipe fittings
Hastelloy C 22 Pipe fittings ( Short Radius Elbows , Long Radius Elbows , Concentric Reducers , Eccentric Reducers , Stub Ends , End Caps , Equal Tees , Weldolets , Pipe Nipples .) ASME/ANSI B16.9, ASME B16.28, MSS-SP-43, MSS SP-79 , Type Seamless / Welded / Fabricated . Hastelloy C-22 / UNS N06022 / DIN W. Nr. 2.4602
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Hastelloy C 276 Pipe fittings
Hastelloy C 276 Pipe fittings ( Short Radius Elbows , Long Radius Elbows , Concentric Reducers , Eccentric Reducers , Stub Ends , End Caps , Equal Tees , Weldolets , Pipe Nipples .) ASME/ANSI B16.9, ASME B16.28, MSS-SP-43, MSS SP-79 , Type Seamless / Welded / Fabricated Hastelloy C276 Pipe Fittings UNS (N10276), DIN (2.4819).
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Inconel 625 Rod
Inconel Round Bar , ASTM B446 Inconel, 625 Bright Round Rod , Inconel 625 Hex Rods ,Inconel 625 flat bar with standard ASTM B446 / ASME SB446 and Nickel Alloy 625/ Inconel 625 (AMS 5666)
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Inconel 601 Welding Wire
Inconel 601 Welding Wire - UNS N06601 - DIN W. Nr.2.4851 . ERNiCrFe-11 (Alloy 601) . ASME II, Part C, SFA-5.14, ERNiCrFe-11 (UNS N06601) , ASME IX, F-No.43 , BS290] NA 49 , DIN 1736 SG-NiCr23Al (2.4626) , (EN) ISO 18274 - SN16601 (NiCr23Fel5Al) , ASME III (NCA3800, NB2400), AMS and other specifications
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Inconel 600 Welding Wire
Inconel 600 Wire ASTM B166 , Inconel 600 welding wire Alloy 600. UNS N06600 / W.Nr. 2.4816 .Nickel Alloy (AWS A5.11) ENiCrFe-3 Welding Electrode, Nickel Alloy ENiCrFe-3 Welding Electrode, ENiCrFe-3 inconel 600
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Invar 32 Wire
Invar 32 Wire Super-Invar 32-5 rod UNS-K-93500, Consisting of 32% Nickel, 5% Cobalt, and the balance Iron, this alloy exhibits minimum thermal expansion (one half of Invar 36) at room temperature. It is often used in structural components, supports and substrates requiring precision measurements. ASTM F1684.
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Invar 32 Sheet
Invar 32 Sheet, plate , Invar Alloy Foil , Super Invar 32-5 Alloy DESCRIPTION. A low expansion alloy consisting of 32% Nickel, 5% Cobalt, balance Iron. This alloy exhibits minimum thermal expansion (one half of Invar 36) Invar-36, Invar-42, Pernifer 36, Invar Steel, Super Invar 32-5, Carpenter 36, 4J32, 4J36
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Invar 36 Plate
Alloy 36 Sheet (Invar) / K93603 / ASTM F1684 Widely known under several trades names such as Invar and Nilo 36**, this grade is a 36% nickel-iron alloy. AMS l-23011 CL7MIL l-23011 CL7UNS K93602/03 4J36 (China), Fe-Ni36 (France), 1.3912, Ni36 (Germany), X1NiCrMoCu, N 25-20-7 (UK) Invar 36, UNSK93600 thermostat alloy, UNSK93601 pressure vessel sheet (USA)
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Alloy 46 Wire
Alloy 46 wire : Consisting of 46% nickel and iron balance, 46 Alloy is a controlled expansion alloy used mostly in electronic applications, especially for glass and ceramic seals. Alloy 46 is also known as Pernifer 462, NILO 464, and Glass-Seal 461 , ,Fe46Ni
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Alloy 46 Sheet
Alloy 46: Consisting of 46% nickel and iron balance, 46 Alloy is a controlled expansion alloy used mostly in electronic applications, especially for glass and ceramic seals. Alloy 46 is also known as Pernifer 462, NILO 464, and Glass-Seal 461
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MP35N Thread Bolt Fastener
MP35N Thread Rod , MP35N bolts , MP35N fasteners , UNS R30035 bolts , MP35N Thread Bar, MP35N Specifications: AMS 5844, AMS 5845, AMS7468, ASTM F562, NACE MR0175. MP35N alloys are used in fasteners, springs, non-magnetic assemblies and instrumentation components in medical, marine, oil and gas well, chemical and food processing environments.
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High Pure Molybdenum Sputtering Target For Semiconductor Application

Molybdenum (Mo) Sputtering Target

Application of Molybdenum Sputtering Target Sputtering is a process whereby atoms are ejected from a solid target material due to the bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

Molybdenum Sputtering Targets Elmet Technologies

Molybdenum SPUTTERING TARGETS: Elmet is a global leader in production of Gen 1 to Gen sputtering targets for the flat panel display industry. Our advanced tungsten and molybdenum solutions also support Semiconductor, Solar, LED and other Display thin film coating applications.

Molybdenum Plansee

Thanks to the special forming processes we use, Plansees molybdenum sputtering targets have a density of almost 100 %. You benefit from a faster process due to higher sputtering speeds. The denser the molybdenum target is, the better the conductivity of the created layer.

High density % Mo molybdenum sputtering target

% Pure Mo Molybdenum Plate Mo Sputtering Target Molybdenum is a silvery-grey metal with a Mohs hardness of . It has a melting point of 2,623 °C (4,753 °F); of the naturally occurring elements, only tantalum, osmium, rhenium, tungsten, and carbon have higher melting points.

Pure Molybdenum Target

Pure molybdenum target, also known as molybdenum sputtering target, can be divided into two types, that is, molybdenum planar target and molybdenum rotary target. In physical vapor deposition technology (PVD), pure molybdenum target with high purity over % is an important key on the production of thin film.

Titanium (Ti) Sputtering Target Stanford Advanced Materials

Application of Titanium Target Sputtering is a process whereby atoms are ejected from a solid target material due to the bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

Molybdenum Sputtering Target, Molybdenum Sputtering Target

Molybdenum is a silvery-grey metal with a Mohs hardness of . It has a melting point of 2,623 °C (4,753 °F); of the naturally occurring elements, only tantalum, osmium, rhenium, tungsten, and carbon have higher melting points.

Pure Metal Targets

Changsha Xinkang Advanced Materials ,Ltd is a professional producer of PVD coating materials, we engaged in producing and suppling the most suitable and high quality metal sputtering targets, metal alloy sputtering targets, ceramic sputtering targets and evaporation materials, for the field of semiconductor and micro-electronics, optical glass coating, decoration, solar photovoltaic coating

Molybdenum (Mo)Metal ,sputtering target, powder, garnule

Molybdenum (Mo)Metal : CRM material ,limited supply many kinds of pure Molybdenum metal product. For Molybdenum have some advantage in chemical and physical, it used widly in High-temperature furnace, glass and crystal producing, vacuum plating, illumination, rare china rare metal material can supply Molybdenum block, rod, tube, plate, foil, wire, substrate, sputtering target

Applications of Molybdenum Metal and Its Alloys

How molybdenum metal products are made 4 Properties and applications of molybdenum 8 Lighting 11 Electrical and electronic devices and manufacturing 12 Electrical power devices 12 Thin ?lms and sputtering targets 16 Semiconductor manufacturing 19 Medical equipment 20 High-temperature processing 22 Hot working 22 Processing liquid metals 25

Molybdenum Sputtering Target AMERICAN ELEMENTS ?

Molybdenum Sputtering Target Mo bulk Sputtering allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto

Molybdenum Sputtering Targets Elmet Technologies

Fully integrated molybdenum sputtering target manufacturing and bonding for flat Semiconductor, Solar, LED and other Display thin film coating applications. the thin film is highly dependent on the quality and purity of the source material.

Molybdenum Plansee

Plansee sputtering targets made of molybdenum are available in form of rotary and planar targets. Our materials excel due to their high purity and density as well as their In our PVD application laboratory, we perform sputtering in near- real life semiconductor base plates and x-ray targets in-house using the PVD, CVD,

Sputtering Targets for Semiconductor Applications ULVAC

Sputtering targets must meet ever tougher standards for high quality to produce of its targets for semiconductor products including high purity cobalt targets and titanium targets. GDMS Analysis/Comparison for Various Tungsten Targets

Molybdenum (Mo) Sputtering Target Stanford Advanced

13 Mar 2019 SAM specializes in producing high purity Molybdenum Sputtering Target with Our rotatory molybdenum sputtering targets have a high utilization rate of density and smallest possible average grain sizes for use in semiconductor, and physical vapor deposition (PVD) display and optical applications.

Sputtering Targets for Semiconductor Applications Umicore

About Sputtering Targets for Semiconductors. 4 for Semiconductor Applications . Sputtering Targets ARQ151-6“. Description. Symbol. Purity . High energy, ce.

MolybdenumBased Sputtering Targets in Flat Panel Displays

12 May 2017 High purity; Dimensional precision and tight tolerance. Superior Molybdenum Sputtering Targets for Flat Panel Display Applications. A range

Sputtering Targets Testbourne Ltd

Sputter target materials can be generally supplied within the purity range of Ltd provide high quality and competitive Target Bonding to Backing Plates. Nowadays applications of sputtering range from semiconductor industry for Aluminium Al, Aluminium-Titanium Al-Ti, Chromium Cr, Chromium-Molybdenum Cr-Mo,

Targets, Coil Sets, Metals Honeywell Electronic Materials

Honeywells sputtering targets, coil sets and high-purity metals fulfill your exacting manufacturing requirements for semiconductor front and back end packaging needs. designs (OEM) found in physical vapor deposition (PVD) applications. the copper, cobalt, titanium, and tungsten raw materials used to make the targets.

Sputtering Targets Deposition Materials Semicore

We supply pure PVD metal targets including gold sputtering targets, molybdenum and niobium alloy compound targets, rotatable targets as well as small bench top coater targets often used for Rs semiconductors, disk

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