Thanks to the special forming processes we use, Plansees molybdenum sputtering targets have a density of almost 100 %. You benefit from a faster process due to higher sputtering speeds . The denser the molybdenum target is, the better the conductivity of the created layer .
% Pure Mo Molybdenum Plate Mo Sputtering Target Molybdenum is a silvery-grey metal with a Mohs hardness of . It has a melting point of 2,623 °C (4,753 °F); of the naturally occurring elements, only tantalum, osmium, rhenium, tungsten, and carbon have higher melting points.
American Elements specializes in producing high purity Tantalum Molybdenum sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Niobium rotary sputtering target ? to provide homogeneous materials which exhibit an extremely high density and fine grain structure. molybdenum or aluminum
AEM-METAL is a reliable niobium sputtering target supplier. We can provide niobium target with uniform, high density microstructure and controlled texture, which promotes uniform sputtering rates and generally superior sputtering behavior.
Molybdenum-Niobium is an exceptionally corrosion resistant alloy with applications in touch screen panels (TSPs) and structural assemblies in high temperature environments. Available alloy forms include sheets, discs, foils, rods, ingots, wires and high-density rotary and planar sputtering targets.
Most are available in a variety of purity levels ranging from commercial to Ultra-Pure grades. Special alloying and fabricating techniques have been developed to provide homogeneous materials which exhibit an extremely high density and fine grain structure. Here are some of the more popular sputtering target metals: Evaporation Materials
About Niobium Sputtering Target. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment,
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Molybdenum is provided with high melting point, low coefficient of thermal expansion, low resistivity, fine thermal stability and fine grain; 3. The fineness of the ito sputtering target can be reached at %, density 10g/cm 3 .
Molybdenum-Tantalum (MoTa) from Plansee is particularly corrosion to its good adherence to glass and a high level of electrical conductivity, molybdenum is Microstructure, fine-grained, homogeneous. High quality sputtering target. High density. We use hot forming processes to compact our MoTa sputtering targets to
High power densities and the flow of electricity through power diodes and After recrystallization, its microstructure is also more fine-grained than in the case of pure Our molybdenum sputtering targets are used to produce thin functional We therefore add the alloy element niobium to our all-round star, molybdenum,
Niobium Sputtering Target Nb bulk research qty manufacturer. in producing high purity Niobium sputtering targets with the highest possible density High and smallest possible average grain sizes for use in semiconductor, chemical Isolation and quantification of a Mo isotope solution from proton irradiated niobium.
Niobium Titanium Sputtering Target Nb-Ti bulk research qty manufacturer. high purity Niobium Titanium Sputtering Targets with the highest possible density High Purity (%) Metallic Sputtering Target and smallest possible average grain sizes for use in semiconductor, Molybdenum Niobium Sputtering Target.
Angstrom Sciences provides the highest quality magnetron sputtering targets including to produce homogenous, fine-grained, high-density materials that conform to the strictest . Molybdenum (Mo), %, 2 Diameter x .125 thick, PVD- Niobium (Nb), %, 3 Diameter x .250 thick, PVD-.
Sputtering Targets, Evaporation Material, Angstrom Sciences. PVD or Molybdenum Disulfide Nickel Oxide. Nickel Silicide. Nickel Vanadium. Niobium . Niobium Oxide Melting (VIM) and Vacuum Arc Casting to produce homogenous, fine-grained, high-density materials that conform to the strictest application standards.
Sputtering targets commercial grade to highest purity, zone refined Ultra-Pure grade. Niobium Sputtering Target; Platinum Sputtering Target; Silicon Sputtering Target materials which exhibit an extremely high density and fine grain structure. Whether you require OFE copper, stainless steel, molybdenum or aluminum.
Due to special forming processes we used, our Niobium sputtering targets possess higher density, fine grain sizes as well as high purity, as a result, you can
The results showed that a fully dense, fine-grained and randomly orientated molybdenum target exhibiting high deposition rate was obtained by hot . Regarding the effect of target density on sputter- .. Niobium, Brussels, Belgium, 2000. 13.
12 May 2017 Different forms of sputtering target materials are produced at . Mo, MoNb, Nb rotary targets; Higher relative density over a HIP target