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Hastelloy C 276 Electrode For Flowmeter
Hastelloy electrodes for magnetic flow meter. The electrodes widely used for electromagnetic flow meter producing, we can customized according your requirements. 316L electrode , Titanium electrode ,Tantalum electrode ,Hastelloy-C electrode.
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Hastelloy C22 Pipe fittings
Hastelloy C 22 Pipe fittings ( Short Radius Elbows , Long Radius Elbows , Concentric Reducers , Eccentric Reducers , Stub Ends , End Caps , Equal Tees , Weldolets , Pipe Nipples .) ASME/ANSI B16.9, ASME B16.28, MSS-SP-43, MSS SP-79 , Type Seamless / Welded / Fabricated . Hastelloy C-22 / UNS N06022 / DIN W. Nr. 2.4602
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Hastelloy C 276 Pipe fittings
Hastelloy C 276 Pipe fittings ( Short Radius Elbows , Long Radius Elbows , Concentric Reducers , Eccentric Reducers , Stub Ends , End Caps , Equal Tees , Weldolets , Pipe Nipples .) ASME/ANSI B16.9, ASME B16.28, MSS-SP-43, MSS SP-79 , Type Seamless / Welded / Fabricated Hastelloy C276 Pipe Fittings UNS (N10276), DIN (2.4819).
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Inconel 625 Rod
Inconel Round Bar , ASTM B446 Inconel, 625 Bright Round Rod , Inconel 625 Hex Rods ,Inconel 625 flat bar with standard ASTM B446 / ASME SB446 and Nickel Alloy 625/ Inconel 625 (AMS 5666)
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Inconel 601 Welding Wire
Inconel 601 Welding Wire - UNS N06601 - DIN W. Nr.2.4851 . ERNiCrFe-11 (Alloy 601) . ASME II, Part C, SFA-5.14, ERNiCrFe-11 (UNS N06601) , ASME IX, F-No.43 , BS290] NA 49 , DIN 1736 SG-NiCr23Al (2.4626) , (EN) ISO 18274 - SN16601 (NiCr23Fel5Al) , ASME III (NCA3800, NB2400), AMS and other specifications
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Inconel 600 Welding Wire
Inconel 600 Wire ASTM B166 , Inconel 600 welding wire Alloy 600. UNS N06600 / W.Nr. 2.4816 .Nickel Alloy (AWS A5.11) ENiCrFe-3 Welding Electrode, Nickel Alloy ENiCrFe-3 Welding Electrode, ENiCrFe-3 inconel 600
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Invar 32 Wire
Invar 32 Wire Super-Invar 32-5 rod UNS-K-93500, Consisting of 32% Nickel, 5% Cobalt, and the balance Iron, this alloy exhibits minimum thermal expansion (one half of Invar 36) at room temperature. It is often used in structural components, supports and substrates requiring precision measurements. ASTM F1684.
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Invar 32 Sheet
Invar 32 Sheet, plate , Invar Alloy Foil , Super Invar 32-5 Alloy DESCRIPTION. A low expansion alloy consisting of 32% Nickel, 5% Cobalt, balance Iron. This alloy exhibits minimum thermal expansion (one half of Invar 36) Invar-36, Invar-42, Pernifer 36, Invar Steel, Super Invar 32-5, Carpenter 36, 4J32, 4J36
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Invar 36 Plate
Alloy 36 Sheet (Invar) / K93603 / ASTM F1684 Widely known under several trades names such as Invar and Nilo 36**, this grade is a 36% nickel-iron alloy. AMS l-23011 CL7MIL l-23011 CL7UNS K93602/03 4J36 (China), Fe-Ni36 (France), 1.3912, Ni36 (Germany), X1NiCrMoCu, N 25-20-7 (UK) Invar 36, UNSK93600 thermostat alloy, UNSK93601 pressure vessel sheet (USA)
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Alloy 46 Wire
Alloy 46 wire : Consisting of 46% nickel and iron balance, 46 Alloy is a controlled expansion alloy used mostly in electronic applications, especially for glass and ceramic seals. Alloy 46 is also known as Pernifer 462, NILO 464, and Glass-Seal 461 , ,Fe46Ni
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Alloy 46 Sheet
Alloy 46: Consisting of 46% nickel and iron balance, 46 Alloy is a controlled expansion alloy used mostly in electronic applications, especially for glass and ceramic seals. Alloy 46 is also known as Pernifer 462, NILO 464, and Glass-Seal 461
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MP35N Thread Bolt Fastener
MP35N Thread Rod , MP35N bolts , MP35N fasteners , UNS R30035 bolts , MP35N Thread Bar, MP35N Specifications: AMS 5844, AMS 5845, AMS7468, ASTM F562, NACE MR0175. MP35N alloys are used in fasteners, springs, non-magnetic assemblies and instrumentation components in medical, marine, oil and gas well, chemical and food processing environments.
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Forging And Rolling Molybdenum Niobium Sputtering Target For Solar Cell

Molybdenum Sputtering TargetProfessional Molybdenum

Shapes of molybdenum sputtering target can be round, rectangle and tube. The regular process of molybdenum sputtering target is sintering, forging, tooling and sputtering target is used in the microelectronic, flat panel display, data storage, optical glass coating and other industries.

Molybdenum sputtering targets. Plansee

Thanks to the special forming processes we use, Plansees molybdenum sputtering targets have a density of almost 100 %. You benefit from a faster process due to higher sputtering speeds. The denser the molybdenum target is, the better the conductivity of the created layer.

Pure Metal Targets

Changsha Xinkang Advanced Materials ,Ltd is a professional producer of PVD coating materials, we engaged in producing and suppling the most suitable and high quality metal sputtering targets, metal alloy sputtering targets, ceramic sputtering targets and evaporation materials, for the field of semiconductor and micro-electronics, optical glass coating, decoration, solar photovoltaic coating

Molybdenum sputtering target Sputtering Targets Suppliers

Molybdenum sputtering target, Mo sputtering target, Molybdenum Niobium alloy,Molybdenum powder,Molybdenum tube,Molybdenum foil,Molybdenum rod,Molybdenum Jiangsu sales@ facebook

Tantalum Molybdenum Sputtering Target American Elements

About Tantalum Molybdenum Sputtering Target American Elements specializes in producing high purity Tantalum Molybdenum sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

Mo, Ti, Ni, Cr, Cu, Al,W, Zr sputtering target

The target of research need to consider the electrical, magnetic, reflectance and color appearance , the company for the various needs of customers, develop appropriate materials and processes, such as metal material smelting casting, forging, rolling and processing technology; ceramic material used to powder production, sintering, hot pressing sintering, hot and so on are pressure

Solar Pv And Heating Industry Molybdenum Niobium Alloy

Solar Pv And Heating Industry Molybdenum Niobium Alloy Sputtering Target , Find Complete Details about Solar Pv And Heating Industry Molybdenum Niobium Alloy Sputtering Target,Solar Pv And Heating Industry Molybdenum Niobium Alloy Sputtering Target,Tungsten Disk Sputtering Target,Mo-nb Disk from Other Metals Metal Products Supplier or Manufacturer-Baoji Kedipu New Material ,

. Starck Product Information Molybdenum sputtering

Highest Quality Sputtering Target Materials. . Starck is one of the world’s largest producers of molybdenum, tungsten, tantalum and niobium metals, and fabricated products with a robust vertically integrated supply chain for supplying sputter targets for thin film coatings applications.

Molybdenumsodium Plansee

The electrical conductivity of a MoNa target is slightly lower than that of a pure molybdenum target, but still perfectly sufficient to perform sputtering in DC mode. Pure material: Whereas sodium increases the efficiency of the CIGS cell, iron results in a loss of efficiency. To keep the iron content as low as possible, we take the greatest

Molybdenum Target, Molybdenum Target Suppliers and

molybdenum plate pure molybdenum sputtering target Our sputtering targets are mainly manufactured from completely rolled molybdenum material in purity level above % Mo min, allowing our customers to match targets to their specific requirements.

Pure Metal Targets

We can produce and supply most of the metal materials on the periodic table, including rare earth metals. We generally use the production process of vacuum melting and hot pressing. By controlling the technical parameters of the processes of forging, rolling and annealing, the finished sputtering target has the characteristics of high density, low gas content, uniform internal structure, the end user can obtain constant erosion rates and high pure and homogeneous thin films during PVD process.

Molybdenum Plansee

Thanks to the special forming processes we use, Plansees molybdenum sputtering targets have a density of almost 100 %.You benefit from a faster process due to higher sputtering denser the molybdenum target is, the better the conductivity of the created layer.. The flexibility of our production process allows to adjust the microstructure of our coating material to achieve just the effect you want.

Molybdenum sputtering target Sputtering Targets Suppliers,Manufacturers

Molybdenum sputtering target, Mo sputtering target, Molybdenum Niobium alloy,Molybdenum powder,Molybdenum tube,Molybdenum foil,Molybdenum rod,Molybdenum Jiangsu sales@ facebook

Tungsten sputtering target for solar cell application in coating

Today, solar cells have been developed to the third generation (thin-film solar cells), and the sputtering process is the first to be the preferred method of preparation. With the rise and rapid development of the global low-carbon economy, the focus of solar cell coating target has become the target of the development of products suppliers around the world. Solar cell film showing explosive growth mode, data show that from 2005 to 2007, the solar battery installed capacity of annual growth

Photovoltaics Plansee

Improved yield: The intelligent target geometries of our u-shaped and dogbone targets, for example, permit material utilization levels of even more than 75 % and thus longer target lifetimes. The principle is simple: We apply more coating material to the areas that are subject to the highest load levels. This allows us to overcome the disadvantages of conventional designs – uneven sputtering and high levels of material loss.

Solar Pv And Heating Industry Molybdenum Niobium Alloy

Solar Pv And Heating Industry Molybdenum Niobium Alloy Sputtering Target , Find Complete Details about Solar Pv And Heating Industry Molybdenum Niobium Alloy Sputtering Target,Solar Pv And Heating Industry Molybdenum Niobium Alloy Sputtering Target,Tungsten Disk Sputtering Target,Mo-nb Disk from Other Metals Metal Products Supplier or Manufacturer-Baoji Kedipu New Material ,

Tantalum Molybdenum Sputtering Target American Elements

American Elements specializes in producing high purity Tantalum Molybdenum sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling

. Starck Product Information Molybdenum sputtering targets for

Highest Quality Sputtering Target Materials. . Starck is one of the world’s largest producers of molybdenum, tungsten, tantalum and niobium metals, and fabricated products with a robust vertically integrated supply chain for supplying sputter targets for thin film coatings applications. Manufacturing facilities produce a broad range of

Molybdenum Sputtering TargetProfessional Molybdenum Sputtering Target

Shapes of molybdenum sputtering target can be round, rectangle and tube. The regular process of molybdenum sputtering target is sintering, forging, tooling and sputtering target is used in the microelectronic, flat panel display, data storage, optical glass coating and other industries.

Molybdenumsodium Plansee

The electrical conductivity of a MoNa target is slightly lower than that of a pure molybdenum target, but still perfectly sufficient to perform sputtering in DC mode. Pure material: Whereas sodium increases the efficiency of the CIGS cell, iron results in a loss of efficiency. To keep the iron content as low as possible, we take the greatest

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