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Hastelloy C 276 Electrode For Flowmeter
Hastelloy electrodes for magnetic flow meter. The electrodes widely used for electromagnetic flow meter producing, we can customized according your requirements. 316L electrode , Titanium electrode ,Tantalum electrode ,Hastelloy-C electrode.
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Hastelloy C22 Pipe fittings
Hastelloy C 22 Pipe fittings ( Short Radius Elbows , Long Radius Elbows , Concentric Reducers , Eccentric Reducers , Stub Ends , End Caps , Equal Tees , Weldolets , Pipe Nipples .) ASME/ANSI B16.9, ASME B16.28, MSS-SP-43, MSS SP-79 , Type Seamless / Welded / Fabricated . Hastelloy C-22 / UNS N06022 / DIN W. Nr. 2.4602
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Hastelloy C 276 Pipe fittings
Hastelloy C 276 Pipe fittings ( Short Radius Elbows , Long Radius Elbows , Concentric Reducers , Eccentric Reducers , Stub Ends , End Caps , Equal Tees , Weldolets , Pipe Nipples .) ASME/ANSI B16.9, ASME B16.28, MSS-SP-43, MSS SP-79 , Type Seamless / Welded / Fabricated Hastelloy C276 Pipe Fittings UNS (N10276), DIN (2.4819).
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Inconel 625 Rod
Inconel Round Bar , ASTM B446 Inconel, 625 Bright Round Rod , Inconel 625 Hex Rods ,Inconel 625 flat bar with standard ASTM B446 / ASME SB446 and Nickel Alloy 625/ Inconel 625 (AMS 5666)
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Inconel 601 Welding Wire
Inconel 601 Welding Wire - UNS N06601 - DIN W. Nr.2.4851 . ERNiCrFe-11 (Alloy 601) . ASME II, Part C, SFA-5.14, ERNiCrFe-11 (UNS N06601) , ASME IX, F-No.43 , BS290] NA 49 , DIN 1736 SG-NiCr23Al (2.4626) , (EN) ISO 18274 - SN16601 (NiCr23Fel5Al) , ASME III (NCA3800, NB2400), AMS and other specifications
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Inconel 600 Welding Wire
Inconel 600 Wire ASTM B166 , Inconel 600 welding wire Alloy 600. UNS N06600 / W.Nr. 2.4816 .Nickel Alloy (AWS A5.11) ENiCrFe-3 Welding Electrode, Nickel Alloy ENiCrFe-3 Welding Electrode, ENiCrFe-3 inconel 600
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Invar 32 Wire
Invar 32 Wire Super-Invar 32-5 rod UNS-K-93500, Consisting of 32% Nickel, 5% Cobalt, and the balance Iron, this alloy exhibits minimum thermal expansion (one half of Invar 36) at room temperature. It is often used in structural components, supports and substrates requiring precision measurements. ASTM F1684.
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Invar 32 Sheet
Invar 32 Sheet, plate , Invar Alloy Foil , Super Invar 32-5 Alloy DESCRIPTION. A low expansion alloy consisting of 32% Nickel, 5% Cobalt, balance Iron. This alloy exhibits minimum thermal expansion (one half of Invar 36) Invar-36, Invar-42, Pernifer 36, Invar Steel, Super Invar 32-5, Carpenter 36, 4J32, 4J36
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Invar 36 Plate
Alloy 36 Sheet (Invar) / K93603 / ASTM F1684 Widely known under several trades names such as Invar and Nilo 36**, this grade is a 36% nickel-iron alloy. AMS l-23011 CL7MIL l-23011 CL7UNS K93602/03 4J36 (China), Fe-Ni36 (France), 1.3912, Ni36 (Germany), X1NiCrMoCu, N 25-20-7 (UK) Invar 36, UNSK93600 thermostat alloy, UNSK93601 pressure vessel sheet (USA)
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Alloy 46 Wire
Alloy 46 wire : Consisting of 46% nickel and iron balance, 46 Alloy is a controlled expansion alloy used mostly in electronic applications, especially for glass and ceramic seals. Alloy 46 is also known as Pernifer 462, NILO 464, and Glass-Seal 461 , ,Fe46Ni
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Alloy 46 Sheet
Alloy 46: Consisting of 46% nickel and iron balance, 46 Alloy is a controlled expansion alloy used mostly in electronic applications, especially for glass and ceramic seals. Alloy 46 is also known as Pernifer 462, NILO 464, and Glass-Seal 461
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MP35N Thread Bolt Fastener
MP35N Thread Rod , MP35N bolts , MP35N fasteners , UNS R30035 bolts , MP35N Thread Bar, MP35N Specifications: AMS 5844, AMS 5845, AMS7468, ASTM F562, NACE MR0175. MP35N alloys are used in fasteners, springs, non-magnetic assemblies and instrumentation components in medical, marine, oil and gas well, chemical and food processing environments.
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Customzied Molybdenum Sputtering Target For Pvd

Molybdenum (Mo) Sputtering Target

Application of?Molybdenum Sputtering Target Sputtering is a process whereby atoms are ejected from a solid target material due to the bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.

Molybdenum Titanium sputtering target Sputtering Targets

We produce a wide range of physical vapor deposition(PVD) materials, chemical vapor deposition(CVD), vacuum sputter coating materials, multi-arc sputtering targets, and our products are widely used in Functional coatings,Decorative coatings, The Flat Panel Display, Glass Coatings, Solar cell, Optical communication ,optical storage

Sputtering Targets PVD Products

PVD Products provides sputtering targets for a wide range of applications from ferromagnetic, complex oxides, and semiconducting films. Our standard round target sizes range from 1 inch to 20 inches in diameter, and the rectangular targets are available in lengths up to and over 2000 mm in single or multiple-piece construction, depending on the metal.

Molybdenum sputtering targets. Plansee SE

Thanks to the special forming processes we use, Plansees molybdenum sputtering targets have a density of almost 100 %. You benefit from a faster process due to higher sputtering speeds. The denser the molybdenum target is, the better the conductivity of the created layer.

High Purity Tungsten Molybdenum Tantalum Nibium Zirconium

High Purity Tungsten Molybdenum Tantalum Nibium Zirconium Hafnium Titanium Sputtering Targets For Pvd , Find Complete Details about High Purity Tungsten Molybdenum Tantalum Nibium Zirconium Hafnium Titanium Sputtering Targets For Pvd,Tungsten Sputtering Target,Tungsten Sputtering Target For Pvd,Molybdenum Sputtering Target For Pvd from Supplier or Manufacturer-Changsha Mingguan Metal

ADVANCED Sputtering Targets Materion

Our broad line of PVD products and services can resolve your concerns for uniformity, reproducibility, purity, homogeneity and other challenges. Examples include: n High purity, low particulation sputtering targets n Proprietary sputter target designs that extend the life of the target n

Sputtering Targets (PVD, CVD)

Sputtering is a physical process whereby atoms in a solid target material are ejected into the gas phase due to bombardment of the material by energetic ions. It is commonly used for thin-film deposition, as well as analytical techniques. Sputtering is largely driven by momentum exchange between the ions and atoms in the material, due to

Sputtering Targets Deposition Materials Semicore

Tell us what vacuum deposition equipment you are using and we can provide you the specifications you need. We supply pure PVD metal targets including gold sputtering targets, titanium-aluminum, vanadium molybdenum and niobium alloy compound targets, rotatable targets as well as small bench top coater targets often used for RD applications.

Molybdenum Sputtering TargetProfessional Molybdenum

Shapes of molybdenum sputtering target can be round, rectangle and tube. The regular process of molybdenum sputtering target is sintering, forging, tooling and sputtering target is used in the microelectronic, flat panel display, data storage, optical glass coating and other industries.

Sputtering Systems PVD Products

Sputtering Systems. PVD Products manufactures sputtering systems for depositing metal and dielectric thin films on substrates up to 300 mm in diameter. An array of magnetron sputtering sources, using RF, DC, or pulsed DC power, are operated singly or in co-deposition mode to produce a wide variety of film compositions.

Sputtering Targets Deposition Materials Semicore Equipment

We supply pure PVD metal targets including gold sputtering targets, titanium- aluminum, vanadium molybdenum and niobium alloy compound targets, rotatable

High Quality Molybdenum Sputtering Target, High Purity

Haohai Metal offers molybdenum sputtering target, high purity, monolithic, rotatable, hip, cylindrical, planar, custom made, cathodic arc, pvd coating, thin film

Sputtering Targets PVD Products

PVD Products provides sputtering targets ranging from 1 inch to 20 inches in copper, and molybdenum, and ultra-high purities of %- % for aluminum, tellurium, titanium, cadmium, silicon, and molybdenum. Custom Targets.

Sputtering Targets Materion

of a physical vapor deposition (PVD) coating is largely dependent on the source material. n Customized precious metal sputter target Molybdenum. Mo. 42.

Molybdenum Sputtering Target AMERICAN ELEMENTS ?

Molybdenum Sputtering Target Mo bulk research qty manufacturer. vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. American Elements specializes in producing custom compositions for

Sputtering Targets for Sale Sputtering Target Supplier – MSE

As a trusted sputtering target supplier, MSE Supplies can provide high-quality products with any chemical composition and size. Find customized sputtering

Our longest sputtering targets to date Plansee

25 May 2018 Plansee sputtering targets are now available in even longer sizes: result in particle formation during the PVD process (arcing effect). Plansee is one of the first vendors to offer Gen and Gen 11 targets made from pure molybdenum. In addition to custom solutions, we supply sputtering targets in all

Sputtering Targets for Thin Film Deposition SigmaAldrich

A variety of sputtering targets for the physical vapor deposition (PVD) of thin films are available from Sigma-Aldrich.

Backing Plates Sputtering Target Backing Plates – Angstrom

We offer backing plates in both standard configurations and custom dimensions to meet your specific requirements. We also We routinely provide backing plates (copper, molybdenum, copper-chromium) for planar, circular and cylindrical sputtering targets, 1 Diameter x .063 thick, OFHC Copper, $, PVD-.

Sputtering targets Umicore

. 5N5. Pd. 3N5, 4N. Nb2O5. 3N. Mo. 3N5. CrNi30. 3N. Si. 5N, 6N Umicore is a leading producer of all kind of sputtering targets for PVD applications

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